Optimization of TiN thin film growth with in situ monitoring: The effect of bias voltage and nitrogen flow rate

Surface and Coatings Technology

Volumn 80, Issue 1-2, 1996, Pages 66-71

  Logothetidis, S ^a   Alexandrou, I ^a   Kokkou, S ^a  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

Ellipsometry; In situ monitoring; Magnetron sputtering; Stoichiometry; Ti2N; TiN

Indexed keywords

COMPOSITION; COMPUTER SIMULATION; CURVE FITTING; ELLIPSOMETRY; FILM GROWTH; MAGNETRON SPUTTERING; OPTIMIZATION; PHASE EQUILIBRIA; PHASE TRANSITIONS; STOICHIOMETRY; TITANIUM NITRIDE; X RAY DIFFRACTION;

EFFECTIVE MEDIUM APPROXIMATION; FILM STRUCTURE; IN SITU CHARACTERIZATION; IN SITU MONITORING; IN SITU SPECTROSCOPIC ELLIPSOMETRY; NITROGEN FLOW RATE; SUBSTRATE BIAS VOLTAGE;

THIN FILMS;

EID: 0030108170     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02687-8     Document Type: Article

References (17)

1. M.Y. Al-Jaroudi, H.T.G. Hentzell, S.E. Hornstrom and A. Bengston, Thin Solid Films, 190 (1990) 265.
2. S. Kadlec, J. Musil and J. Vyskocil, Surf. Coat. Technol., 54/55 (1992) 287.
3. C.A. Dimitriadis, S. Logothetidis and I. Alexandrou, Appl. Phys. Lett., 66 (4) (1995) 502.
4. N. Kumar, M.G. Fissel, K. Pourrezaei, B. Lee and E.G. Douglas, Thin Solid Films, 153 (1987) 287.
5. M. Wittmer, J. Vac. Sci. Technol. A, 3 (1985) 1797.
6. Y.-I. Chen and J.-G. Duh, Surf. Coat. Technol., 47 (1991) 371.
7. J.E. Sungdren, Thin Solid Films, 128 (1985) 21.
8. S. Logothetidis, I. Alexandrou and A. Papadopoulos, J. Appl. Phys., 77 (1995) 1043.
9. I. Petrov, L. Hultman, J.-E. Sudgren and J.E. Greene, J. Vac. Sci. Technol. A, 10 (1992) 265.
10. G. Lemperiere and J.M. Poitevin, Thin Solid Films, 111 (1984) 339.
11. A. Adjaottor, S. Logothetidis, I. Alexandrou, S. Kokkou and E.I. Meletis, Proc. Int. Conf. on Metallurgical Coatings and Thin Films, ICMCTF 95, 24-28 April 1995, San Diego.
12. S. Sambasivan and W.T. Petustey, J. Mater. Res., 9 (1994) 2362.
13. B. Pecz, N. Frangis, S. Logothetidis, I. Alexandrou, P. Barna and J. Stoimenos, Thin Solid Films, 268 (1995) 57.
14. S. Berg, T. Larsson, C. Nender and H.-O. Blom, J. Appl. Phys., 63 (1988) 887.
15. J. Stanislav, J. Sikac and M. Cermak, Thin Solid Films (1990) 255.
16. Z. Pang, M. Boumerzoug, R.V. Kruzelecky, P. Mascher, J.G. Simmons and D.A. Thompson, J. Vac. Sci. Technol. A, 12 (1994) 83.
17. D.E. Aspnes, Thin Solid Films, 89 (1982) 249.