Angle-resolved nanosphere lithography: Manipulation of nanoparticle size, shape, and interparticle spacing

Journal of Physical Chemistry B

Volumn 106, Issue 8, 2002, Pages 1898-1902

  Haynes, Christy L ^a   McFarland, Adam D ^a   Smith, Matthew T ^b   Hulteen, John C ^c   Van Duyne, Richard P ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

^b UNION CARBIDE CORPORATION   (United States)

^c 3M COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERPARTICLE SPACINGS;

CHEMICAL SENSORS; COLLOIDS; CRYSTALS; ELECTRON BEAM LITHOGRAPHY; MASKS; NANOSTRUCTURED MATERIALS; NEAR FIELD SCANNING OPTICAL MICROSCOPY; SPECTROSCOPIC ANALYSIS;

NANOTECHNOLOGY;

EID: 0037187087     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp013570+     Document Type: Article

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