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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1571-1576

Deposition of electronic quality amorphous silicon, a-Si:H, thin films by a hollow cathode plasma-jet reactive sputtering system

(4) Pribil, G a Hubicka Z a,b,c Soukup, R J a Ianno, N J a

a UNIVERSITY OF NEBRASKA LINCOLN (United States)

b INSTITUTE OF PHYSICS (Czech Republic)

c NONE

Author keywords

Si:H

Indexed keywords

EID: 85016920880 PISSN: 07342101 EISSN: 15208559 Source Type: Journal
DOI: 10.1116/1.1359537 Document Type: Conference Paper

Times cited : (25)

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