Quality hydrogenated amorphous silicon deposited by triode assisted reactive sputtering

Solar Energy Materials and Solar Cells

Volumn 56, Issue 2, 1999, Pages 175-182

  Konz, D W ^a   Soukup, R J ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

Fourier transform infrared spectroscopy (FTIR); Glow discharge (GD); Triode assisted reactive sputtering (TARS)

Indexed keywords

AMORPHOUS FILMS; COATING TECHNIQUES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLOW DISCHARGES; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON;

HYDROGENATED AMORPHOUS SILICON; TRIODE ASSISTED REACTIVE SPUTTERING;

SPUTTER DEPOSITION;

EID: 0032686972     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0927-0248(98)00158-5     Document Type: Article

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