Preparation of ZnO films by atmospheric pressure chemical-vapor deposition using zinc acetylacetonate and ozone

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 145-147

  Haga, K ^a   Katahira, F ^a   Watanabe, H ^a  

^a SENDAI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Chemical vapor deposition; Conductivity; Deposition process; Organometallic vapor deposition; Ozone; X ray photoelectron spectroscopy; Zinc oxide

Indexed keywords

CARRIER MOBILITY; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; HALL EFFECT; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OZONE; POLYCRYSTALLINE MATERIALS; SUBSTRATES; THIN FILMS; X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

ATMOSPHERIC PRESSURE CHEMICAL-VAPOR DEPOSITION; HALL MOBILITY;

SUPERCONDUCTING FILMS;

EID: 0032685743     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01649-6     Document Type: Article

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