SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 407, Issue 1-2, 2002, Pages 60-66

Lithium niobate-tantalate thin films on Si by thermal plasma spray CVD

(5) Kulinich, S A a Yamamoto, H a Shibata, J a Terashima, K a Yoshida, T a

a UNIVERSITY OF TOKYO (Japan)

Author keywords

Growth rate; LiNb1 xTaxO3; Thermal plasma spray CVD; Thin films

Indexed keywords

ANISOTROPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; FILM GROWTH; FILM PREPARATION; LITHIUM NIOBATE; MORPHOLOGY; PLASMA SPRAYING; SEMICONDUCTING SILICON; SOL-GELS; THERMAL EFFECTS;

FILM ORIENTATION;

THIN FILMS;

EID: 0037155457 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00013-5 Document Type: Conference Paper

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.