Investigations of the electron field emission properties and microstructure correlation in sulfur-incorporated nanocrystalline carbon thin films

Journal of Applied Physics

Volumn 91, Issue 12, 2002, Pages 10088-10097

  Gupta, S ^a   Weiner, B R ^a   Morell, G ^a  

^a UNIVERSITY OF PUERTO RICO   (Puerto Rico)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON PRECURSORS; CHEMICAL ENVIRONMENT; CHEMICAL ORDER; CHEMICAL VAPOR DEPOSITION PROCESS; CLUSTER SIZES; CONDUCTION ELECTRONS; CONDUCTIVE PATHS; CORRELATION LENGTHS; DEPOSITION TEMPERATURES; DONOR STATE; DUAL ROLE; ELECTRON FIELD EMISSION PROPERTIES; EMISSION BARRIER; EMISSION CURRENT; EX SITU; FIELD EMISSION PROPERTY; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; INTENSITY RATIO; INVERSE RELATIONS; LARGE EMISSION CURRENTS; MICROSTRUCTURAL CHANGES; NANOCRYSTALLINE CARBON; NON DESTRUCTIVE; PHENOMENOLOGICAL MODELS; STRUCTURAL DEFECT; SUBSTRATE TEMPERATURE; SULFUR CONCENTRATIONS; SULFUR INCORPORATION; TURN-ON FIELD;

ATOMIC FORCE MICROSCOPY; CARBON; CHEMICAL VAPOR DEPOSITION; CLUSTER ANALYSIS; FIELD EMISSION; HYDROGEN; HYDROGEN SULFIDE; METHANE; MOLYBDENUM; PHOSPHORUS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS; VAPORS;

SULFUR;

EID: 0037098012     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1477255     Document Type: Article

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