Fabrication and field emission properties of carbon nanotube cathodes

Materials Research Society Symposium - Proceedings

Volumn 593, Issue , 2000, Pages 215-220

  Bower, C ^a   Zhou, O ^a   Zhu, W ^b   Ramirez, A G ^b   Kochanski, G P ^b   Jin, S ^b  

^a UNIVERSITY OF NORTH CAROLINA   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COLD CATHODE TUBES; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC VARIABLES MEASUREMENT; ELECTRON EMISSION; FILM GROWTH; NANOTECHNOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CARBON NANOTUBE FILMS; SPRAY DEPOSITION TECHNIQUE; VACUUM MICROELECTRONIC DEVICES;

NANOTUBES;

EID: 0033698644     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (22)

1. M. S. Dresselhaus, G. Dresselhaus, and P. C. Eklund, Science of Fullerenes and Carbon Nanotubes.(New York: Academic, 1996).
2. Carbon Nanotubes, edited by T. W. Ebbesen (Cleveland, OH: CRC, 1997).
3. W. Zhu, C. Bower, O. Zhou, G. Kochanski, and S. Jin, Appl. Phys. Lett., 75, 873-875, (1999).
4. J. Bonard, J. Salvetat, T. Stockli, W. A. de Heer, L. Forro, and A. Chatelain, Appl. Phys. Lett., 73, 918, (1998).
5. P. G. Collins and A. Zettl, Appl. Phys. Lett., 69, 1969, (1996).
6. W. A. de Heer, A. Chatelain, and D. Ugarte, Science, 270, 1179, (1995).
7. Q. H. Wang, T. D. Corrigan, J. Y. Dai, R. P. H. Chang, and A. R. Krauss, Appl. Phys. Lett., 70, 3308, (1997).
8. A. Thess, R. Lee, P. Nikolaev, H. Dai, P. Petit, J. Robert, C. Xu, Y. H. Lee, S. G. Kim, A. G. Rinzler, D. T. Colbert, G. E. Scuseria, D. Tomanek, J. E. Fischer, and R. E. Smalley, Science, 273, 483, (1996).
9. C. Bower, S. Suzuki, K. Tanigaki, and O. Zhou, Appl. Phys. A, 67, 47-52, (1998).
10. C. Journet, W. Maser, P. Bernier, A. Loiseau, P. Deniard, S. Lefrant. R. Lee, and J. E. Fischer, Nature, 388, 756, (1997).
11. K. B. Shelimov, R. O. Esenaliev, A. G. Rinzler, C. B. Huffman, and R. E. Smalley, Chem. Phys. Lett., 282, 429, (1998).
12. S. Fan, M. G. Chapline, N. R. Franklin, T. W. Tombler, A. M. Cassell, and H. Dai, Science, 283, 512, (1999).
13. Z. F. Ren, Z. P. Huang, J. W. Xu, J. H. Wang, P. Bush, M. P. Siegal, and P. N. Provencio, Science, 282, 1105, (1998).
14. J. Li, C. Papadopoulos, J. M. Xu, and M. Moskovits, Appl. Phys. Lett., 75, 367, (1999).
15. C. Bower, W. Zhu, S. Jin, and O. Zhou, manuscript submitted.
16. W. Zhu, G. P. Kochanski, S. Jin, and L. Seibles, J. Vac. Sci. Technol. B, 14, 2011, (1996).
17. W. Zhu, C. Bower, O. Zhou, G. P. Kochanski, and S. Jin in Flat Panel Displays and Sensors, B. C. edited by F. R. Libsch, R. Friend, T. Jackson and H. Oshima (Mater. Res. Soc. Proc., San Fransico, CA, 1999).
18. I. Brodie and C. A. Spindt, "Vacuum Microelectronics," in Advances in Electronics and Electron Physics, vol. 83, P. W. Hawkes, Ed., 1992.
19. N. Kumar, H. K. Schmidt, and C. Xie, Solid State Technol., 38, 71, (1995).
20. M. W. Geis, J. C. Twichell, J. Macaulay, and K. Okano, Science, 67, 1328, (1995).
21. W. Zhu, G. P. Kochanski, and S. Jin, unpublished.
22. W. Zhu, G. P. Kochanski, and S. Jin, Science, 282, 1471, (1998).