Very low-roughness diamond film deposition using a surface-wave-sustained plasma

Journal of Applied Physics

Volumn 80, Issue 10, 1996, Pages 6013-6020

  Borges, C F M ^a   Airoldi, V T ^a,b   Corat, E J ^a,b   Moisan, M ^a   Schelz, S ^a   Guay, D ^a,c  

^a UNIVERSITÉ DE MONTRÉAL   (Canada)

^b INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

^c INRS EMT   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001250578     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363600     Document Type: Review

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