Low-power 2.45 GHz microwave induced helium plasma source at atmospheric pressure based on microstrip technology

Journal of analytical atomic spectrometry

Volumn 15, Issue 6, 2000, Pages 579-580

  Bilgiç, Attila M ^a   Voges, Edgar ^a   Engel, Ulrich ^a   Broekaert, José A C ^b  

^a TU DORTMUND UNIVERSITY   (Germany)

^b UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHARGE COUPLED DEVICES; CHLORINE COMPOUNDS; ELECTRIC FIELD EFFECTS; HELIUM; MICROSTRIP LINES; MICROWAVES; PERMITTIVITY; PLASMA SOURCES; SAPPHIRE; SUBSTRATES;

ATOMIC EMISSION SPECTROMETRY; MICROSTRIP PLASMA SOURCE; MICROWAVE INDUCED PLASMA;

SPECTROMETRY;

EID: 0033704260     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/b001647k     Document Type: Article

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