Behavior of candidate organic pellicle materials under 157 nm laser irradiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1644-1653

  Grenville, Andrew ^a   Liberman, V ^b   Rothschild, M ^b   Sedlacek, J H C ^b   French, R H ^c   Wheland, R C ^c   Zhang, X ^d   Gordon, J ^d  

^a INTEL CORPORATION   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^c DUPONT COMPANY   (United States)

^d DuPont Photomasks Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER BEAM EFFECTS; MOISTURE; OXYGEN; PHOTOCHEMICAL REACTIONS; PLASTIC FILMS; ULTRAVIOLET RADIATION;

PELLICLE MATERIALS;

PHOTOLITHOGRAPHY;

EID: 0036413060     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474604     Document Type: Article

References (3)

1. R.H. French, J. Gordon, D.J. Jones, M.F. Lemon, R.C. Wheland, E. Zhang, F.C. Zumsteg, K.G. Sharp, W. Qiu, "Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography," Proc. SPIE 4346, 89-97 (2001).
2. V. Liberman, M. Rothschild, N.N. Efremow, S.T. Palmacci, J.H.C. Sedlacek, C. Van Peski, K. Orvek, "Marathon Evaluation of Optical Materials for 157-nm Lithography," Proc. SPIE 4346, 45-51 (2001).
3. R.H. French, R.C. Wheland, D.J. Jones, J.N. Hilfiker, R.A. Synowicki, F.C. Zumsteg, J. Feldman, A.E. Feiring, "Fluoropolymers for 157 nm Lithography: Optical Properties from VUV Absorbance and Ellipsometry Measurements," Proc. SPIE 4000, 1491-1502 (2000).