157 nm pellicles: Polymer design for transparency and lifetime

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 576-583

  French, Roger H ^a   Wheland, Robert C ^a   Qiu, Weiming ^a   Lemon, M F ^a   Blackman, Gregory S ^a   Zhang, Edward ^b   Gordon, Joseph ^b   Liberman, Vlad ^c   Grenville, Andrew ^d   Kunz, Rod ^c   Rothschild, Mordechai ^c  

^a DUPONT COMPANY   (United States)

^b DuPont Photomasks Inc   (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

157 nm lithography; Absorbance; Fluoropolymer; Pellicle; Radiation durability; VUV ellipsometry; VUV spectroscopy

Indexed keywords

DURABILITY; ELLIPSOMETRY; LIGHT ABSORPTION; POLYTETRAFLUOROETHYLENES; QUANTUM EFFICIENCY; SPIN COATING; TRANSPARENCY; ULTRAVIOLET SPECTROSCOPY;

PHOTOCHEMICAL DARKENING;

PHOTOLITHOGRAPHY;

EID: 18644366353     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474605     Document Type: Article

References (4)

1. R.H. French, R.C. Wheland, D.J. Jones, J.N. Hilfiker, R.A. Synowicki, F.C. Zumsteg, J. Feldman, A.E. Feiring, "Fluoropolymers for 157 nm Lithography: Optical Properties from VUV Absorbance and Ellipsometry Measurements", Optical Microlithography XIII, SPIE Vol. 4000, edited by C.J. Progler, 1491-1502 (2000).
2. Roger H. French, Joseph Gordon, David J. Jones, M.F. Lemon, Robert C. Wheland, Edward Zhang, Fredrick C. Zumsteg, Kenneth G. Sharp, Weiming Qiu, "Materials Design and Development of Fluoropolymers for Use as Pellicles in 157 nm Photolithography", Optical Microlithography XIV, SPIE Vol. 4346, (2001).
3. V. Liberman, M. Rothschild, J.H.C. Sedlacek, A. Grenville, R.H. French, "Behavior of Candidate Organic Pellicle Materials Under 157-nm Laser Irradiation", 2002 SPIE Meeting "Optical Microlithography XV", March 2002. SPIE Vol. 4691-56.
4. http://www.microphotonics.com/nst.html or http://instruments.csem.ch/.