Critical point drying and cleaning for MEMS technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3880, Issue , 1999, Pages 51-58

  Jafri, Ijaz ^a   Busta, Heinz ^a   Walsh, Steven ^a  

^a GT Solar Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; DRYING; MICROMACHINING; STICTION; SUPERCRITICAL FLUIDS; SURFACE CLEANING; SURFACE STRUCTURE; SURFACE TENSION;

CRITICAL POINT DRYING; LIQUID PROCESSING; STANDARD RELEASE METHOD;

MICROELECTROMECHANICAL DEVICES;

EID: 0033320125     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (19)