Imaging profiles of light intensity in the near field: Applications to phase-shift photolithography

Applied Optics

Volumn 37, Issue 11, 1998, Pages 2145-2152

  Aizenberg, Joanna ^a   Rogers, John A ^a   Paul, Kateri E ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORMS; IMAGING TECHNIQUES; MATHEMATICAL MODELS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS;

ELASTOMERIC PHASE MASKS; IMAGING PROFILES; PHASE SHIFT PHOTOLITHOGRAPHY; PHOTOSENSITIVE POLYMER SYSTEM;

PHOTOLITHOGRAPHY;

EID: 0032049273     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.002145     Document Type: Article

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