General aspheric refractive micro-optics fabricated by optical lithography using a high energy beam sensitive glass gray-level mask

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3730-3733

  Däschner, Walter ^a   Long, Pin ^a   Stein, Robert ^a   Wu, Chuck ^b   Lee, S H ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Canyon Materials Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); ELECTRON BEAMS; ETCHING; FABRICATION; GLASS; ION BEAMS; LENSES; LIGHT TRANSMISSION; MASKS; OPACITY; OPTICS; PHOTORESISTS;

CHEMICALLY ASSISTED ION BEAM ETCHING; GRAY LEVEL MASK; HIGH ENERGY BEAM SENSITIVE GLASS; OPTICAL LITHOGRAPHY; PROFILE MEASUREMENT; REFRACTIVE LENSES; REFRACTIVE MICROOPTICS;

PHOTOLITHOGRAPHY;

EID: 0038591780     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588657     Document Type: Article

References (16)

1. F. Sauer, J. Jahns, C. R. Nijander, A. Y. Feldblum, and W. P. Townsend, Opt. Eng. 33, 1550 (1994).
2. Z. D. Popovic, R. A. Sprague, and G. A. N. Connell, Appl. Opt. 29, 1281 (1988).
3. M. B. Stern and T. R. Jay, Opt. Eng. 33, 3547 (1994).
4. T. R. Jay and M. B. Stern, Opt. Eng. 33, 3552 (1994).
5. K. Merserau, C. Nijander, A. Feldblum, and W. Townsend, Proc. SPIE 1751, 229 (1992).
6. Z. L. Liau, J. N. Diadiuk, J. N. Walpole, and D. E. Mull. Appl. Phys. Lett. 55, 97 (1989).
7. Y. Opplinger, P. Sixt, J. M. Stauffer, J. M. Mayor, P. Regnault, and G. Voirin, Microelectron. Eng. 23, 449 (1994).
8. H. Andersson, M. Ekberg, S. Hard, S Jacobsson, M. Larsson, and T. Nilsson, Appl. Opt. 29, 4259 (1990).
9. D. R. Purdy, Pure Appl. Opt. 3, 167 (1994).
10. W. Däschner, P. Long, M. Larsson, and S. H. Lee, J. Vac. Sci. Technol. B 13, 2729 (1995).
11. Product Information No. 94-88 of Canyon Materials Inc., San Diego, CA.
12. C. Wu, U.S. Patent No. 5,078,771, Jan. 7th, 1992.
13. K. S. Urquhart, S. H. Lee, C. C. Guest, M. R. Feldman, and H. Farhoosh, Appl. Opt. 28, 3387 (1989).
14. J. Fan, D. Zaleta, K. Urquhart, and S. H. Lee, Appl. Opt. 34, 2522 (1995).
15. W. Däschner, M. Larsson, and S. H. Lee, Appl. Opt. 34, 2534 (1995).
16. W. Däschner, P. Long, R. Stein, C. Wu, and S. H. Lee (unpublished).