Transient-enhanced diffusion in shallow-junction formation

Journal of Electronic Materials

Volumn 31, Issue , 2002, Pages 999-1003

  Fiory, Anthony T ^a   Chawda, S G ^a   Madishetty, S ^a   Mehta, V R ^a   Ravindra, N M ^a   McCoy, S P ^b   Lefrancois M E ^b   Bourdelle, K K ^c   McKinley, J M ^c   Gossmann, H J L ^c   Agarwal, A ^d  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b Vortek Industries Ltd   (Canada)

^c AGERE SYSTEMS   (United States)

^d AXCELIS TECHNOLOGIES   (United States)

Author keywords

Electrical activation; Ion implantation; Spike annealing

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; DIFFUSION; DIODES; DOPING (ADDITIVES); ELECTRIC RESISTANCE; ION IMPLANTATION; SECONDARY ION MASS SPECTROMETRY;

SHALLOW-JUNCTION FORMATIONS;

SEMICONDUCTOR JUNCTIONS;

EID: 0036809275     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-002-0034-6     Document Type: Article

References (12)

1. S. Saito, S. Shishiguchi, A. Mineji, and T. Matsuda, Mater. Res. Soc. Symp. Proc. 532, 3 (1998).
2. N.E.B. Cowern, D.J. Godfrey, and D.E. Sykes, Appl. Phys. Lett. 49, 1711 (1986).
3. M.D. Giles, Appl. Phys. Lett. 62, 1940 (1993).
4. C.S. Rafferty, G.H. Gilmer, M. Jaraiz, D.J. Eaglesham, and H.-J. Gossmann, Appl. Phys. Lett. 68, 2395 (1996).
5. A. Ural, P.B. Griffin, and J.D. Plummer, J. Appl. Phys. 85, 6440 (1999).
6. A. Agarwal, H.-J. Gossmann, D.J. Eaglesham, S.B. Herner, A.T. Fiory, and T.E. Haynes, Appl. Phys. Lett. 74, 2331 and 2345 (1999).
7. K. Suzuki, A. Satoh, T. Aoyama, I. Namura, F. Inoue, Y. Kataoka, Y. Tada, and T. Sugii, J. Electrochem. Soc. 142, 2786 (1995).
8. A.T. Fiory, K.K. Bourdelle, and P.K. Roy, Appl. Phys. Lett. 78, 1071 (2001).
9. A.T. Fiory and K.K. Bourdelle, Appl. Phys. Lett. 74, 2658 (1999).
10. A.T. Fiory, K.K. Bourdelle, M.E. LeFrancois, D.M. Camm, and A. Agarwal, Advances in Rapid Thermal Processing, ed. F. Roozeboom, J.C. Gelpey, M.C. Ozturk, and J. Nakos (Pennington, NJ: Electrochemical Society, 1999), vol. PV 99-10, pp. 133-140.
11. M. Uematsu, Jpn. J. Appl. Phys. 38, 6188 (1999).
12. X.-Y. Liu, W. Windl, and M.P. Masquelier, Materials Research Society Symp. Proc. (Warrendale, PA: Materials Research Society, 2002), vol. 717, pp. C.4.7.1-C.4.7.6.