Structural and electrical properties of polycrystalline silicon films deposited by hot-wire CVD

Solar Energy Materials and Solar Cells

Volumn 74, Issue 1-4, 2002, Pages 233-245

  Lee, Jeong Chul ^a   Kang, Ki Hwan ^a   Kim, Seok Ki ^a   Yoon, Kyung Hoon ^a   Song, Jinsoo ^a   Park, I Jun ^a  

^a Korea Institute of Energy Research (KIER)   (South Korea)

Author keywords

Deposition; Hot wire CVD; Polycrystalline; Silicon films; Solar cells

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL IMPURITIES; CRYSTAL STRUCTURE; CURRENT DENSITY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN GROWTH; NANOSTRUCTURED MATERIALS; POLYSILICON; SECONDARY ION MASS SPECTROMETRY; SILICON SOLAR CELLS;

HOT-WIRE CHEMICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 0036777888     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00079-X     Document Type: Article

References (23)