Deposition of microcrystalline silicon by electron beam excited plasma

Solar Energy Materials and Solar Cells

Volumn 49, Issue 1-4, 1997, Pages 81-88

  Sasaki, Toshiaki ^a   Ryoji, Makoto ^b   Ichikawa, Yukimi ^a   Tohkai, Masakuni ^b  

^a FUJI ELECTRIC CO   (Japan)

^b KAWASAKI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

Electron beam; Excited plasma; Microcrystalline silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; GRAIN SIZE AND SHAPE; HYDROGENATION; PLASMA APPLICATIONS; SURFACE PHENOMENA;

CRYSTALLINE FRACTION; ELECTRON BEAM EXCITED PLASMA; MICROCRYSTALLINE SILICON;

AMORPHOUS SILICON;

EID: 0031339874     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(97)00179-7     Document Type: Article

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