A compact and sensitive two-dimensional angle probe for flatness measurement of large silicon wafers

Precision Engineering

Volumn 26, Issue 4, 2002, Pages 396-404

  Gao, Wei ^a   Huang, Peisen S ^b   Yamada, Tomohiko ^a   Kiyono, Satoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b STONY BROOK UNIVERSITY   (United States)

Author keywords

Angle probe; Autocollimator; Error separation; Flatness; Local slope; Measurement; Quadrant photodiode; Sensitivity; Silicon wafer; Slope probe; Surface profile; Two dimensional

Indexed keywords

ANGLE MEASUREMENT; LIGHT REFLECTION; MEASUREMENT ERRORS; OPTICAL COLLIMATORS; PHOTODIODES; SCANNING;

POSITION-SENSING DEVICES (PSD);

SILICON WAFERS;

EID: 0036776394     PISSN: 01416359     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0141-6359(02)00121-6     Document Type: Article

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