Fullerene nanocomposite resist for nanolithography

Materials Research Society Symposium-Proceedings

Volumn 636, Issue , 2001, Pages D641-D6412

  Ishii, T ^a   Yokoo, A ^a   Murata, Y ^a   Shigehara, K ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL RESISTANCE; DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; FULLERENES; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS;

NANOCOMPOSITE RESISTS;

PHOTORESISTS;

EID: 0034831692     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)