Nanocomposite resists for electron beam nanolithography

Microelectronic Engineering

Volumn 56, Issue 3-4, 2001, Pages 289-294

  Hu, Yongqi ^a   Wu, Hengpeng ^a   Gonsalves, Kenneth ^a,c   Merhari, Lhadi ^b  

^a UNIVERSITY OF CONNECTICUT   (United States)

^b CERAMEC R and D   (France)

^c UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

Author keywords

E Beam lithography; Nanocomposite resist system; Proximity effect

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; NANOSTRUCTURED MATERIALS; PLASMA ETCHING; SILICA;

NANOCOMPOSITE RESISTS;

NANOTECHNOLOGY;

EID: 0035422377     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00420-8     Document Type: Article

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