SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium-Proceedings

Volumn 636, Issue , 2001, Pages D551-D5512

Status of Ion Projection Lithography

(4) Bruenger, Wilhelm H a Kaesmaier, Rainer b Loeschner, Hans c Springer, Reinhard d

a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT (Germany)

b INFINEON TECHNOLOGIES AG (Germany)

c Ionen Mikrofabrikations Syst GmbH (Austria)

d Institut fur Mikroelektronik Stuttgart (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; MAGNETIC THIN FILMS; MASKS; NANOSTRUCTURED MATERIALS; OPTICAL DATA STORAGE; PROJECTION SYSTEMS; SEMICONDUCTOR QUANTUM DOTS; SILICON WAFERS;

ION PROJECTION LITHOGRAPHY (IPL); PROCESS DEVELOPMENT TOOLS (PDT);

ION BEAM LITHOGRAPHY;

EID: 0034826307 PISSN: 02729172 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (3)

References (19)

1
- 0001429835
- A review of ion projection lithography
- (1998) J. Vac. Sci. Technol. , vol.B16 , Issue.3 , pp. 927
- Melngailis, J.¹ Mondelli, A.A.² Berry, I.L.³ Mohondro, R.⁴

2
- 85009925356
- (2000) Proc. SPIE , vol.3997
- Kaesmaier, R.¹ Loeschner, H.²

3
- 0019636783
- (1981) J. Vac. Sci. Technol. , vol.19 , pp. 1259
- Karapiperis, L.¹ Adesida, I.² Lee, C.A.³ Wolf, E.D.⁴

4
- 0016571105
- (1995) J. Vac. Sci. Technol. , vol.12 , pp. 1305
- Kyser, D.F.¹ Viswanathan, N.S.²

5
- 0001662672
- (1988) J. Vac. Sci. Technol. , vol.B6 , pp. 986
- Ando, M.¹ Muray, J.J.²

6
- 0003575116
- (1995) J. Vac. Sci. Technol. , vol.B13 , pp. 2561
- Bruenger, W.H.¹ Buchmann, L.-M.² Naumann, F.³ Friedrich, D.⁴ Finkelstein, W.⁵ Mohondro, R.⁶

7
- 0033267074
- (1999) J. Vac. Sci. Technol. , vol.B17 , Issue.6 , pp. 3098
- De Jager, P.W.H.¹

8
- 0034205378
- (2000) Microelectronic Engineering , vol.53 , pp. 37
- Kaesmaier, R.¹ Löschner, H.²

9
- 0029251808
- (1995) Microelectronic Engineering , vol.27 , pp. 323
- Bruenger, W.H.¹ Loeschner, H.² Fallmann, W.³ Finkelstein, W.⁴ Melngailis, J.⁵

10
- 0000435558
- (1997) J. Vac. Sci. Technol. , vol.B15 , Issue.6 , pp. 2355
- Bruenger, W.H.¹ Torkler, M.² Buchmann, L.-M.³ Finkelstein, W.⁴

11
- 0003491079
- (1999) J. Vac. Sci. Technol. , vol.B17 , Issue.6 , pp. 3116
- Henke, W.¹ Torkler, M.²

12
- 0034206883
- (2000) Microelectronic Engineering , vol.53 , pp. 609
- Letzkus, L.¹ Butschke, J.² Hoefflinger, B.³ Irmscher, M.⁴ Reuter, C.⁵ Springer, R.⁶ Ehrmann, A.⁷ Mathuni, J.⁸

13
- 0033710290
- (2000) Mat. Res. Soc. Symp. Proc. , vol.584 , pp. 3
- Heuberger, A.¹ Bruenger, W.H.²

14
- 0003491542
- MNE-2000, Jena, 18.-21. Sept
- (2000) Microelectronic Engineering
- Hirscher, S.¹

15
- 0000056779
- (1999) Appl. Phys. Lett. , vol.15 , pp. 403
- Terris, B.D.¹

16
- 0032547079
- (1998) Science , vol.280 , pp. 1919
- Chappert, C.¹ Bernas, H.² Ferré, J.³ Kottler, V.⁴ Jamet, J.P.⁵ Chen, Y.⁶ Cambril, E.⁷ Devolder, T.⁸ Rousseaux, F.⁹ Mathet, V.¹⁰ Launois, H.¹¹

17
- 0034205525
- (2000) Microelectronic Engineering , vol.53 , pp. 605
- Bruenger, W.H.¹ Torkler, M.² Dzionk, C.³ Terris, B.D.⁴ Folks, L.⁵ Weller, D.⁶ Rothuizen, H.⁷ Vettiger, P.⁸ Stangl, G.⁹ Fallmann, W.¹⁰

18
- 0000832656
- (1997) Appl. Phys. Lett. , vol.70 , Issue.9 , pp. 1110
- Ishii, T.¹ Nozawa, H.² Tamamura, T.³

19
- 85009920321
- D, Boston, to be published
- (2000) MRS 2000-Fall meeting, Symp.
- Gonsalves, K.E.¹ Hu, Y.² Wu, H.³ Merhari, L.⁴

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