Surface potential images of self-assembled monolayers patterned by organosilanes: Ab initio molecular orbital calculations

Surface and Interface Analysis

Volumn 34, Issue 1, 2002, Pages 601-605

  Saito, N ^a   Hayashi, K ^a   Sugimura, H ^a   Takai, O ^a   Nakagiri, N ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

Ab initio molecular orbital calculation; Kelvin probe force microscopy; Organosilane self assembled monolayers; Surface potential

Indexed keywords

CALCULATIONS; CHEMICAL VAPOR DEPOSITION; FERMI LEVEL; IRRADIATION; MOLECULAR STRUCTURE; MOLECULES; MONOLAYERS; PHOTOLITHOGRAPHY; SILANES; SUBSTRATES; ULTRAVIOLET SPECTROSCOPY;

KELVIN PROBE FORCE MICROSCOPY; MOLECULAR ORBITAL CALCULATION; ORGANOSILANE; PHOTOMASK; SELF-ASSEMBLED MONOLAYER; SURFACE POTENTIAL; VACUUM ULTRAVIOLET;

SURFACE PROPERTIES;

EID: 0036693079     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1369     Document Type: Conference Paper

References (21)