Epitaxial growth of TiO2 (rutile) thin films by halide CVD

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Schuisky, M ^a   Harsta, A ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE;

ANATASE; RUTILE;

CHEMICAL VAPOR DEPOSITION;

EID: 0343390452     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999847     Document Type: Article

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