Binary-solvent developer for cross-linked positive-tone resists

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4217-4221

  Yamaguchi, Toru ^a   Namatsu, Hideo ^a  

^a NTT Basic Research Laboratories   (Japan)

Author keywords

Development; Electron beam lithography; Line edge roughness; Polymer aggregates; Positive tone resists

Indexed keywords

AGGLOMERATION; ATOMIC FORCE MICROSCOPY; BINARY MIXTURES; CROSSLINKING; DISSOLUTION; ORGANIC POLYMERS; ORGANIC SOLVENTS; PARAFFINS; SCANNING ELECTRON MICROSCOPY; SOLVENT EXTRACTION; SURFACE ROUGHNESS;

SUPPRESSED AGGREGATE EXTRACTION DEVELOPMENT (SAGEX) RESISTS;

PHOTORESISTS;

EID: 0036614771     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4217     Document Type: Article

References (14)