Nanometer-level metrology with a low-voltage CD-SEM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 61-70

  Yoshimura, Toshiyuki ^a   Ezumi, Makoto ^a   Otaka, Tadashi ^a   Todokoro, Hideo ^a   Yamamoto, Jiro ^a   Terasawa, Tsuneo ^a  

^a HITACHI LTD   (Japan)

Author keywords

Accuracy; AFM; CD SEM; Low voltage; Metrology; Nano edge roughness; Nanometer; ULSI

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; LITHOGRAPHY; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; OPTICAL VARIABLES MEASUREMENT; POLYMERS; ULSI CIRCUITS;

CRITICAL DIMENSIONS (CD); NANO EDGE ROUGHNESS;

SCANNING ELECTRON MICROSCOPY;

EID: 0032402875     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308768     Document Type: Conference Paper

References (15)