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Volumn 3332, Issue , 1998, Pages 61-70
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Nanometer-level metrology with a low-voltage CD-SEM
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HITACHI LTD
(Japan)
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Author keywords
Accuracy; AFM; CD SEM; Low voltage; Metrology; Nano edge roughness; Nanometer; ULSI
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CALIBRATION;
LITHOGRAPHY;
NANOTECHNOLOGY;
OPTICAL RESOLVING POWER;
OPTICAL VARIABLES MEASUREMENT;
POLYMERS;
ULSI CIRCUITS;
CRITICAL DIMENSIONS (CD);
NANO EDGE ROUGHNESS;
SCANNING ELECTRON MICROSCOPY;
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EID: 0032402875
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.308768 Document Type: Conference Paper |
Times cited : (6)
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References (15)
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