Effective exposure dose measurement in optical microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 810-818

  Inoue, Soichi ^a   Fujisawa, Tadahito ^a   Izuha, Kyoko ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; DOSIMETRY; EXCIMER LASERS; MASKS;

KRYPTON-FLUORIDE-EXCIMER LASER LITHOGRAPHY; PHOTOMASKS;

PHOTORESISTS;

EID: 0033688455     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)