Non-linear dielectric properties of metal-amorphous-tantalum pentoxide-metal structures

Journal of Non-Crystalline Solids

Volumn 303, Issue 1, 2002, Pages 108-113

  Blonkowski, S ^a   Regache, M ^b   Halimaoui, A ^a  

^a STMICROELECTRONICS   (France)

^b ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAPACITANCE; ELECTRODES; LEAKAGE CURRENTS; PERMITTIVITY; SILICA; SURFACE ROUGHNESS; VOLTAGE MEASUREMENT;

ELECTRODE ROUGHNESS;

TANTALUM COMPOUNDS;

EID: 0036567718     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(02)00975-4     Document Type: Article

References (14)