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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 693-701

Oxygen plasma effects on optical properties of ZnSe films

(3) Yan, Li a Woollam, John A a Franke, Eva b

a UNIVERSITY OF NEBRASKA LINCOLN (United States)

b LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTER SIMULATION; ELECTROCHROMISM; ELECTRON CYCLOTRON RESONANCE; ELLIPSOMETRY; ENERGY DISPERSIVE SPECTROSCOPY; INFRARED RADIATION; OXIDATION; OXYGEN; PLASMA APPLICATIONS; SURFACE ROUGHNESS; THIN FILMS;

HERZINGER-JOHS MODEL; OPTICAL CONSTANTS; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 0036564781 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1463085 Document Type: Article

Times cited : (25)

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