Growth of microcrystalline silicon films using deuterium dilution

Journal of Non-Crystalline Solids

Volumn 299-302, Issue , 2002, Pages 93-97

  Suzuki, Susumo ^a   Kondo, M ^a   Matsuda, A ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEUTERIUM; FILM GROWTH; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SURFACE REACTIONS; THERMAL EFFECTS;

HIGH PRESSURE DEPLETION (HPD);

THIN FILMS;

EID: 0036540513     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(02)00953-5     Document Type: Article

References (11)