The role of H in the growth mechanism of PECVD a-Si:H

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 13-18

  Van De Sanden, M C M ^a   Kessels, W M M ^a   Smets, A H M ^a   Korevaar, B A ^a   Severens, R J ^a,b   Schram D C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b AKZO NOBEL CENTRAL RESEARCH   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH (MATERIALS); HYDROGENATION; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TEMPERATURE;

ORDER OF MAGNITUDE; SURFACE HYDROGEN ABSTRACTION PROCESSES; TEMPERATURE DEPENDENCE;

AMORPHOUS SILICON;

EID: 0033298868     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (22)

1. A. Matsuda, K. Nomoto, Y. Takeuchi, A. Suzuki, A. Yuuki, J. Perrin, Surf. Sci. 22, 50 (1990),
2. A. Matsuda, T. Goto, Mat. Res. Soc. Symp. Proc. 164, 3 (1990),
3. J.L. Guizot, K. Nomoto, A. Matsuda, Surf. Sci. 244,22 (1991)
4. J.R. Doyle, D.A. Doughty, A. Gallagher, J. Appl. Phys. 68, 4375 (1990),
5. J.R. Doyle, D.A. Doughty, A. Gallagher, J. Appl. Phys. 71, 4727 (1992),
6. J.R. Doyle, D.A. Doughty, A. Gallagher, J. Appl. Phys. 71,4771 (1992)
7. J. Perrin, Y. Takeda, N. Hitano, Y. Takeuchi, A. Matsuda, Surf. Sci. 210, 114 (1989),
8. J. Perrin, M. Shiritani, P. Kae-Nune, H. Videlot, J. Jolly, J. Guillon, J. Vac. Sci. Technol. A 16, 278 (1998)
9. K. Miyazaki, Y. Mfishiro, T. Kajiwara, K. Uchino, K. Muraoka, T. Okada, M. Maeda, J. Vac. Sci. Technol. A 17,155(1999)
10. M.C.M. van de Sanden, R.J. Severens, W.M.M. Kessels, F. van de Pas, L.J. van IJzendoom, D.C. Schräm, Mat. Res. Soc. Symp. Proc. 467, 621 (1997),
11. M.C.M. van de Sanden, R.J. Severens, W.M.M. Kessels, D.C. Schräm, Plasma Phys. Control. Fusion 41, A365 (1999)
12. J. Robertson, M.J. Powell, Mat. Res. Soc. Symp. Proc. 507,897 (1998)
13. see e.g. K. Sinniah, M.G. Sherman, L.B. Lewis, W.H. Weinberg, J.T. Yates and K.C. Janda, Phys. Rev. Lett. 62,567 (1989)
14. Y. Toyoshima, K. Arai, A. Matsuda, K. Tanaka, J. Appl. Phys. 56,1540 (1990)
15. A. von Keudell, J.R. Abelson, Phys. Rev. B 59, 5791 (1999)
16. S. Ramalingam, D. Maroudas, E. Aydill, Mat. Res. Soc. Symp. Proc. 507,673 (1998)
17. [l 1] W.M.M. Kessels, M.C.M. van de Sanden, R.J. Severens, L.J. van Uzendoorn, D.C. Schräm, Mat. Res. Soc. Symp. Proc. 507, 529 (1998)
18. [12JW.M.M. Kessels, A.H.M. Smets, B.A. Korevaar, G.J. Adriaenssens, M.C.M. van de Sanden, D.C. Schräm, these Proceedings
19. see e.g. D.D. Koleske, S.M. Gates, B. Jackson, J. Chem. Phys. 101,3301 (1994)
20. W.Widdra, S.I. Yi, R. Maboudian, G.A.D.,Briggs, W.H. Weinberg, Phys. Rev. Lett. 74, 2074 (1995)
21. W.M.M. Kessels, R.J. Severens, M.C.M. van de Sanden, D.C. Schräm, J. Non-Cryst. Solids 227-230,133 (1998)
22. G. Ganguly, A. Matsuda, Phys Rev. B 47,3661 (1993)