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Volumn 609, Issue , 2000, Pages A1951-A1956
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Improved crystallinity of microcrystalline silicon films using deuterium dilution
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL MICROSTRUCTURE;
CRYSTALLIZATION;
EMISSION SPECTROSCOPY;
ENERGY GAP;
EPITAXIAL GROWTH;
FILM GROWTH;
HYDROGEN;
ION BOMBARDMENT;
PHASE TRANSITIONS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RATE CONSTANTS;
SEMICONDUCTING SILICON;
EXCHANGE REACTIONS;
THIN FILMS;
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EID: 0034428586
PISSN: 02729172
EISSN: None
Source Type: Journal
DOI: 10.1557/proc-609-a19.5 Document Type: Article |
Times cited : (3)
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References (11)
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