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Volumn 609, Issue , 2000, Pages A1951-A1956

Improved crystallinity of microcrystalline silicon films using deuterium dilution

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; EMISSION SPECTROSCOPY; ENERGY GAP; EPITAXIAL GROWTH; FILM GROWTH; HYDROGEN; ION BOMBARDMENT; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RATE CONSTANTS; SEMICONDUCTING SILICON;

EID: 0034428586     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-609-a19.5     Document Type: Article
Times cited : (3)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.