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Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 1223-1226

Pulsed laser deposition of CNx films: Role of r.f. nitrogen plasma activation for the film structure formation

(6) Bulir J a Novotny M a Jelinek M a Lancok J a Zelinger, Z b Trchova M c

a INSTITUTE OF PHYSICS (Czech Republic)

b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY (Czech Republic)

c CHARLES UNIVERSITY (Czech Republic)

Author keywords

C3N4; Laser; Radio frequency (r.f.); Spectroscopy

Indexed keywords

EXCIMER LASERS; NITROGEN; PULSED LASER DEPOSITION; SPECTROSCOPIC ANALYSIS;

OPTICAL EMISSION SPECTROSCOPY (OES);

THIN FILMS;

CARBON NITRIDE;

EID: 0036508524 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(01)00587-8 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.