Properties and preparation conditions of carbon nitride thin films deposited by laser CVD

Carbon

Volumn 36, Issue 5-6, 1998, Pages 765-769

  Falk, F ^a   Meinschien, J ^a   Schuster, K ^a   Stafast, H ^a  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

Author keywords

B. Chemical vapor deposition; C. x ray photoelectron spectroscopy (XPS)

Indexed keywords

EID: 0001615725     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0008-6223(98)00003-7     Document Type: Article

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