Excimer laser crystallized poly-Si TFTs on plastic substrates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4426, Issue , 2002, Pages 394-400

  Gosain, Dharam Pal ^a  

^a SONY CORPORATION   (Japan)

Author keywords

Excimer laser anneal; Flat panel display; Low temperature doping; Plastic substrate; Poly Si; Sputtered film; Thin film transistor

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; FLAT PANEL DISPLAYS; GLASS; HIGH TEMPERATURE EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASTIC PRODUCTS; POLYSILICON; SEMICONDUCTOR DOPING; SPUTTERING; SUBSTRATES; THIN FILM TRANSISTORS; TRANSMISSION ELECTRON MICROSCOPY;

SOLID PHASE CRYSTALLIZATIONS (SPC);

EXCIMER LASERS;

EID: 0036386063     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.456886     Document Type: Conference Paper

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