Excimer laser processing for a-Si and poly-Si thin film transistors for imager applications

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1823-1829

  Lu, J P ^a   Mei, P ^a   Fulks, R T ^a   Rahn, J ^a   Ho, J ^a   Wang, Y ^a   Boyce, J B ^a   Street, R A ^a  

^a PALO ALTO RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITANCE; CRYSTALLIZATION; EXCIMER LASERS; FLAT PANEL DISPLAYS; IMAGE SENSORS; LEAKAGE CURRENTS; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING;

PULSED EXCIMER LASER ANNEALING (ELA);

THIN FILM TRANSISTORS;

EID: 0034230198     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582480     Document Type: Article

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