Stencil mask distortion control using nonsymmetric perforation rings

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 225-228

  Sprague, M ^a,c   Semke, W ^a   Engelstad, R ^a   Lovell, E ^a   Chalupka, A ^b   Loschner H ^b   Stengl, G ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b Ion Microfabrication Systems GmbH   (Austria)

^c UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; ION BEAMS; MASKS; MEMBRANES; NATURAL FREQUENCIES; VIBRATIONS (MECHANICAL);

NONSYMMETRIC PERFORATION RINGS;

LITHOGRAPHY;

EID: 0031681963     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00051-3     Document Type: Article

References (3)

1. J. Wolfe, et al., J. Vac. Sci. Technol. B, Vol. 13, No. 6, pp. 2613-2617, 1995.
2. L. Didenko, et al., Microelectronic Engineering, Vol. 35, pp. 443-446, 1997.
3. H. Löschner (unpublished).