Comparison of substrate curvature and resonant frequency thin film stress mapping techniques

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 539-548

  Schlax, Michael P ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a   Brooks, Cameron ^a   Magg, Chris ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; NATURAL FREQUENCIES; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; STRESS ANALYSIS; SUBSTRATES; THIN FILMS;

STRESS MEASUREMENT;

LITHOGRAPHY;

EID: 0033699503     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)