Relaxed silicon-germanium on insulator (SGOI)

Materials Research Society Symposium - Proceedings

Volumn 686, Issue , 2002, Pages 21-26

  Cheng, Zhiyuan ^a   Currie, Matthew T ^a   Leitz, Chris W ^a   Taraschi, Gianni ^a   Lee, Minjoo L ^a   Pitera, Arthur ^a   Hoyt, Judy L ^a   Antoniadis, Dimitri A ^a   Fitzgerald, Eugene A ^a  

^a Massachusetts Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DELAMINATION; ELECTRON MOBILITY; EPITAXIAL GROWTH; ION IMPLANTATION; MOSFET DEVICES; OXIDATION; SEMICONDUCTING SILICON COMPOUNDS;

ULTRAHIGH CHEMICAL VAPOR DEPOSITION (UHCVD);

SILICON ON INSULATOR TECHNOLOGY;

EID: 0036349420     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)