Surface potential contrasts between silicon surfaces covered and uncovered with an organosilane self-assembled monolayer

Ultramicroscopy

Volumn 91, Issue 1-4, 2002, Pages 151-156

  Hayashi, Kazuyuki ^a   Saito, Nagahiro ^a   Sugimura, Hiroyuki ^a   Takai, Osamu ^a   Nakagiri, Nobuyuki ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

Dipole moment; Kelvin probe force microscopy; MO calculation; Organosilane self assembled monolayer; Surface potential

Indexed keywords

MICROMETERS; MICROSCOPIC EXAMINATION; MONOLAYERS; PHOTOLITHOGRAPHY;

DIPOLE MOMENTS;

SILICON;

3,3,3 TRIFLUOROPROPYLTRIMETHOXYSILANE; HEPTADECAFLUORO 1,1,2,2 TETRAHYDRODECYL 1 TRIMETHOXYSILANE; OCTADECYLTRIMETHOXYSILANE; SILANE DERIVATIVE; SILICON; UNCLASSIFIED DRUG;

AB INITIO CALCULATION; ARTICLE; MICROSCOPY; SURFACE PROPERTY; TECHNIQUE; VAPOR;

EID: 0036326336     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(02)00094-3     Document Type: Article

References (26)