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Volumn 4692, Issue , 2002, Pages 421-432

Monte-Carlo methods for chemical-mechanical planarization on multiple-layer and dual-material models

Author keywords

CMP; Greedy; Monte Carlo; Multiple layer; STI

Indexed keywords

DIELECTRIC MATERIALS; LINEAR PROGRAMMING; MONTE CARLO METHODS; VLSI CIRCUITS;

EID: 0036030256     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.475677     Document Type: Conference Paper
Times cited : (6)

References (16)
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    • New Monte-Carlo algorithms for layout density control
    • Y. Chen, A.B. Kahng, G. Robins and A. Zelikovsky, "New Monte-Carlo Algorithms for Layout Density Control", Proc. ASP-DAC, 2000, pp. 523-528.
    • (2000) Proc. ASP-DAC , pp. 523-528
    • Chen, Y.1    Kahng, A.B.2    Robins, G.3    Zelikovsky, A.4
  • 3
  • 11
    • 0002066448 scopus 로고    scopus 로고
    • A closed-form analytical model for ILD thickness variation in CMP processes
    • B. Stine, "A Closed-Form Analytical Model for ILD Thickness Variation in CMP Processes", Proc. CMP-MIC, 1997.
    • (1997) Proc. CMP-MIC
    • Stine, B.1
  • 12
    • 0032000527 scopus 로고    scopus 로고
    • Rapid characterization and modeling of pattern dependent variation in chemical mechanical polishing
    • Feb.
    • B. Stine, D. Ouma, R. Divecha, D. Boning and J. Chung, "Rapid Characterization and Modeling of Pattern Dependent Variation in Chemical Mechanical Polishing", IEEE Trans. Semi. Manuf., Feb. 1998.
    • (1998) IEEE Trans. Semi. Manuf.
    • Stine, B.1    Ouma, D.2    Divecha, R.3    Boning, D.4    Chung, J.5
  • 13
    • 0033719809 scopus 로고    scopus 로고
    • Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability
    • June
    • R. Tian, D. Wong, and R. Boone, "Model-Based Dummy Feature Placement for Oxide Chemical-Mechanical Polishing Manufacturability", Proc. Design Automation Conf., June 2000, pp. 667-670.
    • (2000) Proc. Design Automation Conf. , pp. 667-670
    • Tian, R.1    Wong, D.2    Boone, R.3
  • 14
    • 0034825838 scopus 로고    scopus 로고
    • Dummy feature placement for chemical-mechanical polishing uniformity in a shallow trench isolation process
    • Apr.
    • R. Tian, X. Tang and D.F. Wong, "Dummy feature placement for chemical-mechanical polishing uniformity in a shallow trench isolation process", International Symposium on Physical Design: Apr. 2001, pp. 118-123.
    • (2001) International Symposium on Physical Design , pp. 118-123
    • Tian, R.1    Tang, X.2    Wong, D.F.3
  • 16
    • 0033314270 scopus 로고    scopus 로고
    • A two-dimensional low pass filter model for die-level topography variation resulting from chemical mechanical polishing of ILD films
    • Washington, DC, Dec.
    • T. Yu, S. Cheda, J. Ko, M. Roberton, A. Dengi, and E. Travis, "A Two-Dimensional Low Pass Filter Model for Die-Level Topography Variation Resulting from Chemical Mechanical Polishing of ILD Films", 1999 IEDM, Washington, DC, Dec. 1999.
    • (1999) 1999 IEDM
    • Yu, T.1    Cheda, S.2    Ko, J.3    Roberton, M.4    Dengi, A.5    Travis, E.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.