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Volumn , Issue , 2000, Pages 523-528

Monte-Carlo algorithms for layout density control

Author keywords

[No Author keywords available]

Indexed keywords

FAST DYNAMICS; FILLING METHODS; LOCAL CHARACTERISTICS; MANUFACTURABILITY; MONTE CARLO ALGORITHMS; RUNTIMES; VERY DEEP SUB MICRONS;

EID: 0000709420     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/368434.368778     Document Type: Conference Paper
Times cited : (33)

References (12)
  • 2
    • 0003552056 scopus 로고    scopus 로고
    • SEE ALSO SIA, Semiconductor Industry Association, December
    • HTTP://WWW.ITRS.NET/. SEE ALSO SIA, The National Technology Roadmap for Semiconductors, Semiconductor Industry Association, December 1997.
    • (1997) The National Technology Roadmap for Semiconductors
  • 10
    • 0032028732 scopus 로고    scopus 로고
    • The Physical and Electrical Effects of Metal-fill Patterning Practices for Oxide Chemical-Mechanical Polishing Processes
    • B. E. STINE, D. S. BONING, J. E. CHUNG, AND L. CAMILLETTI, The Physical and Electrical Effects of Metal-fill Patterning Practices for Oxide Chemical-Mechanical Polishing Processes, IEEE Transactions on Electron Devices, 45 (1998), pp. 665-679.
    • (1998) IEEE Transactions on Electron Devices , vol.45 , pp. 665-679
    • Stine, B.E.1    Boning, D.S.2    Chung, J.E.3    Camilletti, L.4
  • 12
    • 0031173556 scopus 로고    scopus 로고
    • Solid State Technology
    • M. TOMOZAWA, Oxide CMP Mechanisms, Solid State Technology, (1997), pp. 169-175.
    • (1997) Oxide CMP Mechanisms , pp. 169-175
    • Tomozawa, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.