Two-dimensional low pass filter model for die-level topography variation resulting from chemical mechanical polishing of ILD films

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1999, Pages 909-912

  Yu, Tat Kwan ^a   Chheda, Sejal ^a   Ko, Judy ^a   Roberton, Mark ^a   Dengi, Aykut ^a   Travis, Ed ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; FAST FOURIER TRANSFORMS; FREQUENCY DOMAIN ANALYSIS; INTEGRATED CIRCUIT LAYOUT; MATHEMATICAL MODELS; POLYNOMIALS;

CHEMICAL MECHANICAL POLISHING; DIE LEVEL WAFER TOPOGRAPHY; INTERCONNECT METAL DENSITY; PLANARIZATION EFFECTS; TWO DIMENSIONAL LOW PASS FILTER MODEL;

LOW PASS FILTERS;

EID: 0033314270     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)