Insertion effects of various acid sensitive groups into acetal type polymer on the profile of 248 nm chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 660-670

  Chung, Yoon Sik ^a   Kim, Hyun Jin ^a   Cho, Sook Hee ^a   Lee, Dong Hwal ^a   Im, Kwang Hwyi ^a   Yim, Yoon Gil ^a   Kim, Deog Bae ^a   Kim, Jaehyun ^a  

^a Dongjin Semichem Co Ltd   (South Korea)

Author keywords

Hybrid System; KrF lithography; LER; Surface Erosion

Indexed keywords

ANNEALING; EROSION; ESTERS; HYDROGEN BONDS; MONOMERS; POLYSTYRENES; SYNTHESIS (CHEMICAL);

SURFACE EROSION;

PHOTORESISTS;

EID: 0036030097     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474266     Document Type: Conference Paper

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