Design of acid labile protecting groups in chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 608-616

  Fujita, Jun ^a   Sasaki, Koshi ^a   Kameyama, Yasuhiro ^a   Chika, Yuzuru ^a   Kashiwagi, Takeshi ^a   Niinomi, Takaaki ^a   Tanaka, Yuki ^a   Tarutani, Shinji ^a   Ochiai, Tameichi ^a  

^a MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COMPUTATIONAL METHODS; SENSITIVITY ANALYSIS; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESISTS; MOLECULAR ORBITAL (MO) CALCULATION;

PHOTORESISTS;

EID: 0032675490     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (11)