Dissolution kinetics and PAG interaction of phenolic resins in chemically amplified resists

Journal of Photopolymer Science and Technology

Volumn 10, Issue 3, 1997, Pages 397-408

  Ito, Hiroshi ^a   Alexander, Debra Fenzel ^a   Breyta, Greg ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Acid catalyzed deprotection; Chemical amplification; Dissolution kinetics; Quartz crystal microbalance

Indexed keywords

EID: 0000066650     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.397     Document Type: Article

References (10)

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