Recent advances in increasing the thermal flow resistance of acetal-derivatized polyhydroxystyrene deep-UV matrix resins

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 672-679

  Kometani, Janet M ^a   Houlihan, Francis M ^a   Timko, Allen G ^a   Nalamasu, Omkaram ^a   Reichmanis, Elsa ^a   Heffner, Sharon A ^a   Galvin Donoghue, Mary E ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

248 mn; Acetal; Acetoxystyrene; Deep UV; Polyhydroxystyrene

Indexed keywords

BLENDING; DISSOLUTION; MANGANESE COMPOUNDS; MICROMETERS; RESINS; THICKNESS MEASUREMENT;

248 MN; ACETAL; ACETOXYSTYRENE; DEEP-UV; POLYHYDROXYSTYRENE;

HYDRAULIC STRUCTURES;

EID: 0005079683     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312466     Document Type: Conference Paper

References (6)

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