Investigation on dissolution rate effect of newly prepared polystyrene copolymer on the profiles of DUV resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue I, 2001, Pages 528-535

  Kim, H J ^a   Chung, Y S ^a   Choi, Y J ^a   Kim, Y S ^a   Kim, D B ^a  

^a Dongjin Semichem Co Ltd   (South Korea)

Author keywords

Dissolution rate; KrF lithography; KrF resist; Polymer structure

Indexed keywords

DISSOLUTION; MOLECULAR WEIGHT; PHOTORESISTS; POLYMER BLENDS; POLYSTYRENES;

POLYDISPERSITY; POLYMER STRUCTURE;

COPOLYMERS;

EID: 0034758536     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436885     Document Type: Conference Paper

References (10)