Preparation of strontium titanate thin films by mirror-confinement-type electron cyclotron resonance plasma sputtering

Thin Solid Films

Volumn 390, Issue 1-2, 2001, Pages 70-75

  Baba, So ^a   Numata, Ken ^b   Saito, Hidenori ^b   Kumagai, Masao ^c   Ueno, Toshiyuki ^a   Kyoh, Bunkei ^d   Miyake, Shoji ^a  

^a OSAKA UNIVERSITY   (Japan)

^b Kanagawa High Technology Foundation   (Japan)

^c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^d KINKI UNIVERSITY   (Japan)

Author keywords

Electron cyclotron resonance plasma sputtering; Mirror confinement; Strontium titanate

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; FILM PREPARATION; PLASMA APPLICATIONS; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; SUBSTRATES; THERMAL EFFECTS;

MIRROR CONFINEMENT;

STRONTIUM COMPOUNDS;

EID: 0035973336     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00940-3     Document Type: Article

References (18)