Low-temperature and high-rate deposition of SrTiO3 thin films by RF magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 1, 2000, Pages 172-177

  Kohara, Naoki ^a   Yoshida, Akihisa ^a   Sawada, Taisuke ^a   Kitagawa, Masatoshi ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; FILM PREPARATION; GRAIN BOUNDARIES; LEAKAGE CURRENTS; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; PERMITTIVITY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; THICKNESS MEASUREMENT;

CURRENT VOLTAGE MEASUREMENT; OPTICAL EMISSION SPECTROSCOPY;

STRONTIUM COMPOUNDS;

EID: 0033901795     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.39.172     Document Type: Article

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